@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix isothes: <http://purl.org/iso25964/skos-thes#> .
@prefix uneskos: <http://purl.org/umu/uneskos#> .
@prefix obo: <http://purl.obolibrary.org/obo/> .

<http://data.loterre.fr/ark:/67375/37T-Technique__Analysis_or_measurement_method>
  skos:prefLabel "Technique / Méthode d'analyse ou de mesure"@fr, "Technique / Analysis or measurement method"@en ;
  a isothes:ConceptGroup ;
  skos:member <http://data.loterre.fr/ark:/67375/37T-QT3FN9M9-D> .

<http://data.loterre.fr/ark:/67375/37T-Asymmetric_organocatalysis>
  skos:prefLabel "Asymmetric organocatalysis"@en, "Organocatalyse asymétrique"@fr ;
  a isothes:ConceptGroup ;
  skos:member <http://data.loterre.fr/ark:/67375/37T-QT3FN9M9-D> .

<http://data.loterre.fr/ark:/67375/37T> a skos:ConceptScheme .
<http://data.loterre.fr/ark:/67375/37T-QT3FN9M9-D>
  skos:hiddenLabel "Secondary ion mass spectrometry"@en, "Spectrométrie SIMS"@fr, "Spectromètre ion secondaire"@fr, "Spectrométrie ion secondaire"@fr ;
  uneskos:memberOf <http://data.loterre.fr/ark:/67375/37T-Technique__Analysis_or_measurement_method>, <http://data.loterre.fr/ark:/67375/37T-Asymmetric_organocatalysis> ;
  skos:exactMatch obo:FIX_0000122, <http://id.nlm.nih.gov/mesh/M0027922>, <https://en.wikipedia.org/wiki/Secondary_ion_mass_spectrometry>, <https://dbpedia.org/page/Secondary_ion_mass_spectrometry> ;
  skos:prefLabel "spectrométrie SIMS"@fr, "secondary ion mass spectrometry"@en ;
  skos:altLabel "spectrométrie de masse d'ions secondaires"@fr, "spectrométrie de masse à ionisation secondaire"@fr ;
  a skos:Concept ;
  skos:relatedMatch <https://doi.org/10.1351/goldbook.S05522> ;
  skos:inScheme <http://data.loterre.fr/ark:/67375/37T> ;
  skos:definition "Secondary-ion mass spectrometry (SIMS) is a technique used to analyze the composition of solid surfaces and thin films by sputtering the surface of the specimen with a focused primary ion beam and collecting and analyzing ejected secondary ions. The mass/charge ratios of these secondary ions are measured with a mass spectrometer to determine the elemental, isotopic, or molecular composition of the surface to a depth of 1 to 2 nm. Due to the large variation in ionization probabilities among elements sputtered from different materials, comparison against well-calibrated standards is necessary to achieve accurate quantitative results. SIMS is the most sensitive surface analysis technique, with elemental detection limits ranging from parts per million to parts per billion. (From Wikipedia)"@en .